Publications



Popular Articles

  1. A. Belkind, S. Zarrabian, and F. Engle, Plasma Cleaning of Metals: Lubricant Oil Removal, Metal Finishing, July 1996, p.19
  2. K. Becker and A. Belkind, Introduction to Plasmas – Part 1, Vacuum Technology and Coating, September, 2003, p.30
  3. K. Becker and A. Belkind. Introduction to Plasmas - Part 2, Plasmas in Deposition Processes: Plasma Chemistry and Plasma-Wall Interactions, Vacuum Technology and Coating, January, 2004, p.
  4. K. Becker and A. Belkind, Introduction to Plasmas - Part 3a. Plasmas in Deposition Processes: How Plasmas Are Made, Vacuum Technology and Coating, May, 2004.
  5. K. Becker and A. Belkind, Introduction to Plasmas - Part 3b, Pulsed Plasmas in Deposition Processes, Vacuum Technology and Coating, January, 2006, p.33.
  6. K. Becker and A. Belkind, Introduction to Plasmas, Vacuum Technology and Coating, October, 2007, p.32.
  7. Belkind, How Plasmas Are Made, Vacuum Technology and Coating, November, 2007, p.80.
  8. A. Belkind and G. Tompa, DC and Pulsed DC Gas Flow Hollow Cathode Sputter-Deposition, Vacuum Technology and Coating, January, 2008, p.50.
  9. Belkind and K. Becker, Plasma Chemistry, Vacuum Technology and Coating, March, 2008, p.54.
  10. A. Belkind and S. Gershman, Plasma Diagnostics, Part I: Electrical Probe Diagnostics Techniques, Vacuum Technology and Coating, March, 2008, p.54.
  11. A. Belkind and K. Becker, Plasma - Wall Interaction: DC and Pulsed DC Plasmas, Vacuum Technology and Coating, May, 2008, p.58.
  12. A. Belkind and S. Gershman, Plasma Cleaning of Surfaces, Vacuum Technology and Coating, November 2008, p. 46.
  13. A. Belkind and S. Gershman, Plasma Diagnostics, Part II: Optical Emission Spectroscopy, August, 2009, p.38.
  14. A. Belkind and S. Gershman, Plasma Diagnostics, Part III: Laser Induced Fluorescence, Vacuum Technology and Coating, October, 2010, p.38.
  15. A. Belkind and S. Gershman, Deposition of Thin Films by Thermal Evaporation: Part I. Basics, Vacuum Technology and Coating, February, 2011, p.34.
  16. J. Katz and A. Belkind, Titanium and titanium alloy surfaces in medicine: importance of the oxide layer, Vacuum Technology and Coating, May, 2016, p.25.
  17. J. Katz and A. Belkind, Titanium and titanium alloy surface layer modification: plasma oxidation and oxygen plasma immersion ion implantation, Vacuum Technology and Coating, September, 2016, p.31

Some Technical Papers

1987 - 2016



  1. K. Memarzadeh, J.A. Woollam, and A. Belkind, Ellipsometric study of ZnO/Ag/ZnO optical coatings: Determination of layer thicknesses and optical constants, Proc. SPIE, 823, 54-61, (1987).
  2. K. Memarzadeh, J.A. Woollam, and A. Belkind, Variable Angle of Incidenc Spectroscopic Ellipsometric (VASE) Characterization of TiO2/Ag/TiO2 Optical Coatings, J. Appl. Phys., 64(7), 3407-3410 (1988).
  3. V. Koss, A. Belkind, K. Memarzadeh, and J.A. Woollam, Determination of optical constants of Ag layers in ZnO/Ag/ZnO coatings using variable angle spectroscopic ellipsometry, Solar Energy Materials, 19, 67-78 (1989).
  4. J.A. Dobrowolski, F.C. Ho, A. Belkind, and V.A. Koss, Merit Functions for More Effective Thin Film Calculations, Applied Optics, 28, 2824-2831 (1989).
  5. A. Belkind, B. Kopp and R. Sherman, Deposition of AlOxFy films using dc reactive sputtering, Thin Solid Films, 199, 279-290 (1991).
  6. A. Belkind, E. Ezell, W. Gerristead, Z. Orban, P. Rafalko, D. Dow, J. Felts, and R. Laird, Co-sputtering of alloys. 1. co-sputtering of oxides and nitrides using two planar magnetrons, J.Vac.Sci.Technol., A9, 530-536 (1991).
  7. M. Moradi, C. Nender, S. Berg, H.-O. Blom, A. Belkind, and Z. Orban, Modeling of multicomponent reactive sputtering, J.Vac.Sci.Technol., A9, 619-624 (1991).
  8. V.A. Koss, A. Belkind, and J.L. Vossen, Yield analysis of multilayer optical coatings, Applied Optics, 31, 960-963 (1992).
  9. R. Laird and A. Belkind, Co-sputtered films of mixed TiO2/SiO2, J.Vac.Sci.Technol., A 10 (1992) 1908.
  10. A. Belkind and Z. Orban, Magnetic biasing effects while using an unbalanced planar magnetron, J.Vac.Sci.Technol., A 11 (1993) 642-646.
  11. A.I. Belkind, Cosputtering and serial cosputtering using cylindrical rotatable magnetrons, J.Vac.SciTechnol., A11 (1993) 1501-1509.
  12. P. Carlson, S. Berg, A. Belkind, and L.V. Katardjiev, Serial co-sputtering of metals: modeling of sputtering from a periodically co-deposited surface, Surf. Coat. Technol., 61 (1993) 287-92.
  13. A. Belkind, S. Krommenhoek, H. Li, Z. Orban, and F. Jansen, Removal of oil from metals by plasma techniques, Surf.Coat.Technol., 68/69 (1994) 804-808.
  14. A. Belkind, H. Li, H. Clow, and F. Jansen, Oil removal from metals by linear multi-orifice hollow cathode, Surf.Coat.Technol, 76-77 (1995) 738.
  15. A. Belkind, F. Engle, and S. Zarrabian, Plasma cleaning of metals: lubricant oil removal, Metal Finishing, 94 (1996) 19.
  16. A. Belkind, F. Jansen, H. Li, and Z. Orban, An in situ XPS study of hollow cathode plasma cleaning and recontamination of an aluminum surface, Surf.Coat.Technol., 92 (1997) 171.
  17. A. Belkind and F. Jansen, Anode effects in magnetron sputtering, Surf.Coat.Technol., 99 (1998) 52.
  18. A. Belkind, A. Freilich, and R. Scholl, Pulse duration effects in pulse-power reactive sputtering of Al2O3, Surf.Coat.Technol., 108-109 (1998) 558.
  19. A. Belkind, A. Freilich, and R. Scholl, Using Pulsed DC Power for Reactive Sputtering of Al2O3., J.Vac.Sci.Technol., A 17 (1999) 1934.
  20. A. Belkind, Z. Zhao and R. Scholl, Dual-anode Magnetron Sputtering, Surface and Coating Technology, 163 -164 (2003) 695.
  21. A. Belkind, A. Freilich, G. Song, Z. Zhao, R. Scholl, and E. Bixon, Mid-Frequency Reactive Sputtering of Dielectrics: Al2O3, Surface and Coating Technology, 174-175 (2003) 88.
  22. A. E. Delahoy, S. Y. Guo, C. Paduraru and A. Belkind, Reactive-environment, hollow cathode sputtering: Basic characteristics and application to Al2O3, doped ZnO, and In2O3:Mo, J. Vac. Sci. Technol. A 22 (2004) 1697.
  23. A Belkind, A Freilich, J Lopez, Z Zhao, W Zhu and K Becker, Characterization of pulsed dc magnetron sputtering plasmas, New Journal of Physics, 7 (2005) 90.
  24. J. Lopez, W. Zhu, A. Freilich, A. Belkind, and K. Becker, Optical Emission From Pulsed DC Magnetron Sputtering Plasmas, IEEE Transactions on Plasma Science, 33 (2005) 348.
  25. J. Lopez, W. Zhu, A. Freilich, A. Belkind, and K. Becker, Time-resolved optical emission spectroscopy of pulsed DC magnetron sputtering plasmas, J. Phys. D: Appl. Phys. 38 (2005) 1.
  26. A. Belkind, A. Freilich, and K Becker, Characterization of pulsed sputtering plasmas, New Journal of Physics, 7 (2005) 90.
  27. J. Lopez, W. Zhu, A. Freilich, A Belkind, and K Becker, Optical emission from pulsed dc magnetron sputtering plasmas, IEEE Transactions on Plasma Science, 33 (2005) 348.
  28. J. Lopez, W. Zhu, A. Freilich, A Belkind, and K Becker, Time-resolved optical emission spectroscopy of pulsed DC magnetron sputtering plasmas, J. Phys. D: Appl. Phys. 38 (2005) 1769.
  29. A. Belkind, W. Zhu, J. Lopez, and K Becker, Time-resolved optical emission spectroscopy during pulsed dc magnetron sputter deposition of Ti and TiO2 thin films, Plasma Sources Sci. Technol. 15 (2006) S17.
  30. W. Zhu, G. Buyle, J. Lopez, S. Shanmugmurthy, A. Belkind, K. Becker, and R. De Gryse, Plasma emission redistribution in a single cycle of a pulsed dc magnetron, New Journal of Physics, 8 (2006) 146.
  31. S. Gershman, O. Mozgina, A. Belkind, K. Becker, and E. Kunhardt, Electrical Discharges in Bubbled Water., Contrib. Plasma Phys. 46 (2007) 19.
  32. C. Paduraru, K.H. Becker, A. Belkind, J.L. Lopez, Y.A. Gonzalvo, Characterization of the Remote Plasma Generated in a Pulsed-DC Gas-Flow Hollow-Cathode Discharge, IEEE Transactions on Plasma Physics, 35 (2007) 527.
  33. O. Mozgina, A. Koutsospyros, S. Gershman, A. Belkind, C. Christodoulatos, and K. Becker, Decomposition of Energetic Compounds by Pulsed Electrical Discharges in Gas-Bubbled Aqueous Solutions, IEEE Trans. Plasma Sci. 37, 905-910 (2009).
  34. S. Gershman, A. Belkind, and K. Becker, Optical emission diagnostics of the plasma channel in a pulsed electrical discharge in a gas bubble, IEEE Transactions Pulsed Power, Pulsed Power Conference, (2009) 838-843.
  35. S. Gershmana and A. Belkind, Time-resolved processes in a pulsed electrical discharge in argon bubbles in water, Eur. Phys. J. D 60 (2010) 661-672.
  36. Nokes, T. J., Hausmann, R.G.M., VanLehn, K., & Gershman, S. (2011). Testing the instructional fit hypothesis: The case of self-explanation prompts. Instructional Science, 39 (pp. 645-666)
  37. S. Gershman, S. Zwicker, A Belkind, Pulsed electrical discharge propagation along the surface of liquid dielectricts, Pulsed Power Conference (PPC), (2013) 19th IEEE , vol. 1, no. 4, pp.16-21 June 2013
  38. S. A. Wissel1, A. Zwicker1, J. Ross, S. Gershman, The use of dc glow discharges as undergraduate educational tools, Am. J. Phys. 81, 663 (2013).
  39. J. Katz, S. Gershman, A. Belkind, Optical Emission Spectroscopy and Contact Angle Study of Plasma Cleaning of Titanium Alloy Surfaces: Argon Plasma, Plasma Medicine, 5 (2015) 223–236.
  40. S. Gershman, Y. Raitses, Unstable Behavior of Anodic Arc Discharge for Synthesis of Nanomaterials, J. Phys. D: Appl. Phys. 49 (2016) 345201 (9pp)

Patents

  1. V.V. Aleksandrov, K.A. Balodis, and A.I. Belkind, High quantum yield photoelectron amplifier photocathode and contains tetra-seleno-tetracene and metalic caesium, SU 775786, Jan. 11, 1980.
  2. A.I. Belkind, E. Bjornard, J.J. Hofmann, Donald V. Jacobson, and S.J. Nadel, Transparent Coatings by Reactive Sputtering, US, 4,769,291; Sep. 6, 1988.
  3. A.I. Belkind, D.B. Dow, J.T. Felts, M.R. Kirs, R.E. Laird, S.C. Schulz, Co-sputtering homogeneous deposits on large moving substrate - using 2 parallel rotating tubular targets so positioned that material from each is deposited onto other before transfer to substrate, WO 9201081, Jan. 23, 1992
  4. A.I. Belkind, C. Boehmler, M.R. Kirs, J.R. Kurie, and Z. Orban, Cylindrical Magnetron Shield Structure, US 5108574, Apr. 28, 1992.
  5. A. Belkind, L. Wamboldt, and J. Wolfe, Device and Method for Depositing Metal Oxide Films, US 5338422, Apr. 16, 1994.
  6. J.D. Wolfe, A. Belkind, and R. Laird, Durable Low-Emissivity Solar Control Thin Film Coating, US 5377045, Dec.27, 1994.
  7. A. Belkind, F. Jansen, S.K. Krommenhoek, and Z. Orban, Hollow cathode array for plasma generation in substrate surface treatment - has plasma generated in housing with several spaced openings in wall, EP 634778, Jan. 18, 1995.
  8. J.D. Wolfe, A. Belkind, and R. Laird, Durable Low-Emissivity Solar Control Thin Film Coating, US 5,563,734, Oct.8, 1996.
  9. J. Countrywood, A. Belkind, Z. Zarrabian, C. Sherwood, and F. Jansen, Plasma treating apparatus, EP 818801, Apr. 07, 1997
  10. A. Belkind, F. Jansen, S.K. Krommenhoek, and Z. Orban, Hollow cathode array for plasma generation in substrate surface treatment - has plasma generated in housing with several spaced openings in wall, US 5,627,435, May 6, 1997.
  11. J. Countrywood, Z. Zarrabian, A. I. Belkind C. Sherwood, and F. Jansen, Plasma apparatus and method, US 6,110,540, Aug. 29, 2000.
  12. R. Scholl and A. Belkind, Method and Apparatus for substrate biasing in multiple electrode sputtering systems, US 6,818,103, November 16, 2004; WO 01/29278 A1, April 26, 2001.
  13. F. Jansen, R.A. Hougle, R.C. Paciej, E.F. Ezzel, A.I. Belkind, P.A. Stockman, K.W. Cross, and R.E. Doxstader, Process for cleaning and/or passivating of the inner surfaces of a cylindrical gas cylinder by means of a plasma, EP 1186353, 2002